Astrophysical Fluid Dynamics by Eduardo Battaner, ISBN 0521437474
This textbook is a general introduction to the dynamics of astrophysical fluids for students with a knowledge of basic physics at undergraduate level. No previous knowledge of fluid dynamics or astrophysics is required because the author develops all new concepts in context. The first four chapters cover classical fluids, relativistic fluids, photon fluids, and plasma fluids, with many cosmic examples being included. The remaining six chapters deal with astrophysical applications: stars, stellar systems, astrophysical plasmas, cosmological applications, and the large-scale structure of the Universe. Astrophysical fluid dynamics is a promising branch of astronomy, with wide applicability. This textbook considers the role of plasma and magnetism in planets, stars, galaxies, the interplanetary, interstellar and intergalactic media, as well as the Universe at large.
Plasma Charging Damage
This book provides an in-depth, comprehensive and up-to-date coverage of the subject of plasma charging damage in modern VLSI circuit manufacturing. It is written for beginners as well as practitioners. For beginners, this book presents an easy-to-follow, unified explanation of various charging-damage phenomena, the goal being to provide them with a solid foundation for taking on real damage problems encountered in VLSI manufacturing. For practitioners, it can help bridge the gap between disciplines by providing all of the necessary background materials in one place.Drawing on the author's wide range of experience in plasma science, processing technologies, device physics and reliability physics, the text includes information on: - plasma and mechanisms of plasma damage; - wear-out and breakdown of thin gate-oxides; - the impact of processing equipment on damage; - methods of damage measurement; - damage management; - gate-oxide scaling.
Plasma Charging Damage 
Plasma > Plasma Charging Damage
Handbook of Semiconductor Manufacturing Technology, Second Edition
The second edition of this handbook provides an up-to-date reference on the individual processes, equipment, and materials of semiconductor manufacturing technologies. Edited by renowned experts, this book provides graphs, tables, and formulas for easy access to information as well as extensive references for further study.This edition features new and updated chapters on silicon materials, SOI materials and devices, surface preparation, ion implantation, dopant diffusion, in-line metrology, yield modeling, photomask fabrication, failure analysis, damascene copper electroplating, rapid thermal processing, interlevel dielectrics, plasma etch, chemical vapor deposition, and more.
Handbook of Semiconductor Manufacturing Technology, Second Edition
Plasma > Handbook of Semiconductor Manufacturing Technology, Second Edition