Fundamentals of Plasma Physics
Fundamentals of Plasma Physics is a general introduction designed to present a comprehensive, logical and unified treatment of the fundamentals of plasma physics based on statistical kinetic theory, with applications to a variety of important plasma phenomena. Its clarity and completeness makes the text suitable for self-learning and for self-paced courses.
Throughout the text the emphasis is on clarity, rather than formality, the various derivations are explained in detail and, wherever possible, the physical interpretations are emphasized. The mathematical treatment is set out in great detail, carrying out the steps which are usually left to the reader. The problems form an integral part of the text and most of them were designed in such a way as to provide a guideline, stating intermediate steps with answers.
Introduction to Plasma Physics: With Space and Laboratory Applications
Emphasizing basic plasma theory, with applications to both space and laboratory plasmas, the topics covered in this text include single-particle motions, kinetic theory, magnetohydrodynamics, small amplitude waves in both cold and hot plasmas, nonlinear phenomena and collisional effects. Applications comprise planetary magnetospheres and radiation belts, the confinement and stability of plasmas in fusion devices, the propagation of discontinuities and shock waves in the solar wind, and the analysis of various types of plasma waves and instabilities that can occur in planetary magnetospheres and laboratory plasma devices.
Introduction to Plasma Physics: With Space and Laboratory Applications 
Plasma > Introduction to Plasma Physics: With Space and Laboratory Applications
Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, ISBN 0521591759
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science....
Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, ISBN 0521591759
Plasma > Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, ISBN 0521591759