Radiative Processes in Astrophysics by George B. Rybicki, ISBN 0471827592
Radiative Processes in Astrophysics This clear, straightforward, and fundamental introduction is designed to present<->from a physicist’ s point of view<->radiation processes and their applications to astrophysical phenomena and space science. It covers such topics as radiative transfer theory, relativistic covariance and kinematics, bremsstrahlung radiation, synchrotron radiation, Compton scattering, some plasma effects, and radiative transitions in atoms. Discussion begins with first principles, physically motivating and deriving all results rather than merely presenting finished formulae. However, a reasonably good physics background (introductory quantum mechanics, intermediate electromagnetic theory, special relativity, and some statistical mechanics) is required. Much of this prerequisite material is provided by brief reviews, making the book a self-contained reference for workers in the field as well as the ideal text for senior or first-year graduate students of astronomy, astrophysics, and related physics courses. Radiative Processes in Astrophysics also contains about 75 problems, with solutions, illustrating applications of the material and methods for calculating results. This important and integral section emphasizes physical intuition by presenting important results that are used throughout the main text; it is here that most of the practical astrophysical applications become apparent.
The Framework of Plasma Physics
Plasma physics is a necessary part of our understanding of stellar and galactic structure. It determines the magnetospheric environment of the earth and other planets; it forms the research frontier in such areas as nuclear fusion, advanced accelerators, and high power lasers; and its applications to various industrial processes (such as computer chip manufacture) are rapidly increasing. It is thus a subject with a long list of scientific and technological applications. This book provides the scientific background for understanding such applications, but it emphasizes something else: the intrinsic scientific interest of the plasma state. It attempts to develop an understanding of this state, and of plasma behavior, as thoroughly and systematically as possible. The book was written with the graduate student in mind, but most of the material would also fit into an upper-level undergraduate course.
The Framework of Plasma Physics 
Plasma > The Framework of Plasma Physics
Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, ISBN 0521591759
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science....
Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, ISBN 0521591759
Plasma > Plasma Processes for Semiconductor Fabrication by W. Nicholas G. Hitchon, ISBN 0521591759